Magneto-Optical Effects and Electrical Resistivity of La0.8-xBixSr0.2MnO3 Films

MAGNETO-OPTICAL KERR EFFECTS OF AMORPHOUS Nd-Co FILMS

The complex off-diagonal components of conductivity tensor (g:, = 4, + i<,) of Co, a-Nd-Co and a-Y-Co was obtained by measuring magneto-optical Kerr effects, reflectivity and transmissivity in the range of fw = 0.8 eV 5eV. Nd-Co showed much greater wcr;, than Y-Co and the difference was deduced to be due to 4f T--t 5d 1. electron transition of Nd.

Magneto-optical properties of MnBiAl thin films

Structural, Electrical and Optical Properties of Molybdenum Oxide Thin Films Prepared by Post-annealing of Mo Thin Films

Molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using DC magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°C) with flow oxygen at 200 sccm (standard Cubic centimeter per minute). The crystallographic structure of the films was obtained by means of x-ray diffraction (XRD) analysis. An atomic force micr...

Anisotropic electrical resistivity during annealing of oriented columnar titanium films

We report on the evolution of anisotropic electrical resistivity versus temperature of titanium thin films. An oriented titanium film (1 μm thick) is sputter deposited by GLancing Angle Deposition (GLAD) using an incident angle α = 80° of the particle flux. Two parallel Ti electrodes cover this GLAD film. We measure the components of the conductivity tensor by the van der Pauw method during an ...

Structural, Electrical and Optical Properties of Molybdenum Oxide Thin Films Prepared by Post-annealing of Mo Thin Films

Molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using DC magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°C) with flow oxygen at 200 sccm (standard Cubic centimeter per minute). The crystallographic structure of the films was obtained by means of x-ray diffraction (XRD) analysis. An atomic force micr...